Publication Details
Authors
Keisuke Fukuda, Satoru Miyamoto, Masahiro Nakahara, Shota Suzuki, Marwan Dhamrin, Kensaku Maeda, Kozo Fujiwara, Yukiharu Uraoka, and Noritaka Usami
Journal
DOI
Online publication date
September 12, 2022
Press release online (in Japanese)
PDF: 773KB
From: Epitaxial growth of SiGe films by annealing Al-Ge alloyed pastes on Si substrate